Layout support + widget fixes

This allows you to layout glyphs according to some predefined strategy within a predefined area, e.g. right justified. You can optionally draw a border round the layout area which can be etched in/out or bevelled in/out. Layouts can be organised within layouts allowing for arbitrarily complex structures. My calculations tell me that if you put a border round sub-layouts you can get a nice table effect (which might interest BillP). This is based on the stuff Ben wrote up in architecting XEmacs, the bugs are all my own. This also fixes a whole bunch of bugs in the subwindow support. I intend applying this tomorrow morning GMT unless 21.2.20 is imminent. andy 1999-08-23 Andy Piper <andy(a)xemacs.org&gt; * event-Xt.c (emacs_Xt_handle_magic_event): use find_matching_subwindow to check whether the exposure is totally inside a subwindow, if it is then ignore it. * glyphs.c (find_matching_subwindow): new function. * gutter-items.el (update-tab-in-gutter): call add-tab-to-gutter here if we don't have one. * toolbar-x.c (x_draw_blank_toolbar_button): use new x_output_shadows signature. (x_output_toolbar_button): use new x_output_x_pixmap signature. * redisplay.h (struct display_box): new structure. (struct display_glyph_area): ditto. declare new display_box functions. * redisplay-x.c (x_output_pixmap): update for new display box stuff. (x_bevel_area): update to allow multiple edge styles and border segments. (x_output_display_block): update for new display_box stuff and signatures. (x_clear_region): ditto. (x_output_x_pixmap): ditto. adjust offsets rather than clip. (console_type_create_redisplay_x): declare new console methods. (x_output_vertical_divider): update for new bevel_area signature. (x_output_shadows): update to allow selective drawing of edges. * redisplay-tty.c (tty_output_display_block): do nothing for layouts. * redisplay-output.c (redisplay_output_subwindow): convert to use display_box structure, this allows us to put subwindows anywhere with any offset, useful for layout glyphs. (redisplay_output_layout): new function. output a layout and its sub-glyphs. (redisplay_output_pixmap): new modular function combining generic parts of the X and mswindows versions. convert to use display_box structures. (redisplay_clear_clipped_region): new function. clear the area a glyph is going into. (redisplay_normalize_glyph_area): new function. calculate the bounds of a display_glyph_area given a display_box. (redisplay_normalize_display_box): new function. shrink a display_box to enclose a display_glyph_area. (redisplay_display_boxes_in_window_p): check whether the input display_box and display_glyph_area are actually in a window. (redisplay_calculate_display_boxes): calculate display boxes based on conventional display_line metrics. (bevel_modeline): update for new bevel_area signature. * redisplay-msw.c (mswindows_output_blank): update for new display_box stuff. (mswindows_output_string): ditto. (mswindows_output_dibitmap): ditto. (mswindows_output_dibitmap_region): ditto. (mswindows_output_pixmap): ditto. (mswindows_bevel_area): update to allow multiple edge styles and border segments. (mswindows_output_display_block): update for new display_box stuff and signatures. (mswindows_clear_region): ditto. (console_type_create_redisplay_mswindows): declare new console methods. * lisp.h (edge_style): new enum. declare display_box and display_glyph_area. * gutter.c (output_gutter): update for new bevel_area signature. * glyphs.h (image_instance_type): add layout. (IMAGE_LAYOUT_MASK): ditto. (LAYOUT_IMAGE_INSTANCEP): new macro. (CHECK_LAYOUT_IMAGE_INSTANCE): ditto. (struct Lisp_Image_Instance): add offsets for layout and the layout type itself. move mask here also. (IMAGE_INSTANCE_LAYOUT_CHILDREN): new macro. (IMAGE_INSTANCE_LAYOUT_BORDER): ditto. (XIMAGE_INSTANCE_LAYOUT_CHILDREN): ditto. (XIMAGE_INSTANCE_LAYOUT_BORDER): ditto. * glyphs.c (mark_image_instance): update for layouts. (print_image_instance): ditto. (image_instance_equal): ditto. (image_instance_hash): ditto. (allocate_image_instance): initialise offsets for layout. (decode_image_instance_type): update for layouts. (encode_image_instance_type): ditto. (Fimage_instance_height): ditto. (Fimage_instance_width): ditto. (allocate_glyph): ditto. (glyph_width): allow image instances as an argument. update for layouts. (glyph_height_internal): ditto. (syms_of_glyphs): add layout symbols. * glyphs-x.h (struct x_image_instance_data): remove mask entry. (IMAGE_INSTANCE_X_MASK): update. * glyphs-x.c (x_label_instantiate): new function. instantiate a label. (image_instantiator_format_create_glyphs_x): initialise new layout glyph type. * glyphs-widget.c: new layout type. (check_valid_orientation): new keyword checker for layouts. (check_valid_justification): ditto. (check_valid_border): ditto. (check_valid_glyph_or_image_list): ditto. (layout_possible_dest_types): new function for layout glyph type. (layout_normalize): ditto. (layout_instantiate): ditto. (syms_of_glyphs_widget): new keywords for layout. (image_instantiator_format_create_glyphs_widget): initialise the layout glyph type. * glyphs-msw.h (struct mswindows_image_instance_data): remove mask argument. (IMAGE_INSTANCE_MSWINDOWS_MASK): update. * glyphs-msw.c: declare layout format. (image_instantiator_format_create_glyphs_mswindows): initialise it. * general.c: new symbols for layouts. * console.h (struct console_methods): new console methods for outputting pixmaps and strings. * lwlib-Xm.c (xm_create_label_field): new function for creating labels. (xm_creation_table): use it. * lwlib-Xaw.c (xaw_create_label_field): new function for creating labels. (xaw_creation_table): use it. -------------------------------------------------------------- Dr Andy Piper Senior Consultant Architect, BEA Systems Ltd